By: David Kanter (dkanter.delete@this.realworldtech.com), January 20, 2018 1:26 pm
Room: Moderated Discussions
David Hess (davidwhess.delete@this.gmail.com) on January 15, 2018 5:29 pm wrote:
> David Kanter (dkanter.delete@this.realworldtech.com) on January 15, 2018 9:57 am wrote:
> >
> > ...
> >
> > Intel’s engineers essentially backported
> > the second and third generation FinFETs from the 10nm and 14nm processes to 22FFL, improving performance
> > and power efficiency with superior fin geometry and workfunction metals. Intel also created a large
> > library of digital and analog transistors and passive components.
>
> I always wondered if features introduced in more advanced processes were
> backported to larger feature sizes. Now I know. Thanks David.
I think that's a relatively new phenomenon at Intel. Historically, they made all their money on the newest process over a 2-3 year window. As that window stretches, its more important to improve the process including using new techniques.
David
> David Kanter (dkanter.delete@this.realworldtech.com) on January 15, 2018 9:57 am wrote:
> >
> > ...
> >
> > Intel’s engineers essentially backported
> > the second and third generation FinFETs from the 10nm and 14nm processes to 22FFL, improving performance
> > and power efficiency with superior fin geometry and workfunction metals. Intel also created a large
> > library of digital and analog transistors and passive components.
>
> I always wondered if features introduced in more advanced processes were
> backported to larger feature sizes. Now I know. Thanks David.
I think that's a relatively new phenomenon at Intel. Historically, they made all their money on the newest process over a 2-3 year window. As that window stretches, its more important to improve the process including using new techniques.
David
