David Wang's IEDM Article now available

Article: Process Technology Advancements at IEDM 2007
By: Potatoswatter (potswa_mac.delete@this.nospam.com), January 22, 2008 6:18 am
Room: Moderated Discussions
IntelUser2000 (Intel_user2000@yahoo.ca) on 1/22/08 wrote:
---------------------------
>David Wang (dwang@not.here.com) on 1/21/08 wrote:
>---------------------------
>>Anders Jensen (@.) on 1/21/08 wrote:
>>---------------------------
>>>Nice article! Thanks a lot. Just wondering about on thing.
>>>
>>>Updated Process Technology Cross Comparison chart shows a value of just 1 nm for
>>>"high performance/Intel/2007/t_ox". I thought the t_ox value of Intel's 45 nm was
>>>much more than 1 nm due to its High-k materials.
>>
>>Good catch.
>>
>>One caveat is that there's no standard way of measuring tox, so just take the self-reported
>>tox numbers with a grain of salt. More as a general reference than anything really useful.
>>
>>However, more importantly to the point here is that I forgot to add a footnote
>>to Intel's reported tox number on 45 nm - it's reported in units of EOT (equivalent
>>oxide thickness), not physical thickness. That was a question I noted down to go
>>back and chase down, but never did. I will take a note to see if Intel will give
>>out the physical gate thickness on the 45 nm process.
>>
>>David
>>
>
>I know quite long time ago when Intel first demonstrated High-K Metal gate devices,
>they said the tox was 3.0nm. Perhaps they are using similar thickness...

Demonstration technology might not be so strongly correlated to the final thing. 3 nm sounds thick enough to be reliable to me, but what do I know?

It seems a silly parameter to use an "equivalent" for, but whatever. Who really needs more than Igate, Vt, Vbreakdown :v) . It's nice that there's room to make it much thinner in the future.

And Dave, thanks a ton for compiling that table!
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TopicPosted ByDate
David Wang's IEDM Article now availableDavid Kanter2008/01/20 10:43 PM
  David Wang's IEDM Article now availableDoug Siebert2008/01/21 12:02 AM
    David Wang's IEDM Article now availableDavid Wang2008/01/21 01:00 PM
      David Wang's IEDM Article now availableAlberto2008/01/21 02:40 PM
    David Wang's IEDM Article now availableAlberto2008/01/21 03:24 PM
  David Wang's IEDM Article now availablejumpingjack2008/01/21 01:07 AM
  David Wang's IEDM Article now availableAnders Jensen2008/01/21 02:15 AM
    David Wang's IEDM Article now availableDavid Wang2008/01/21 12:36 PM
      David Wang's IEDM Article now availableIntelUser20002008/01/22 04:28 AM
        David Wang's IEDM Article now availablePotatoswatter2008/01/22 06:18 AM
          David Wang's IEDM Article now availableDavid Wang2008/01/22 08:26 PM
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