Acknowledgements
We would likes to thank the following persons that contributed to this article.
Gary Dagastine, co-media relations director of IEDM, for providing the IEDM 2007 Technical digest and for his general assistance.
Professor Weizhong Wang of the University of Wisconsin, Milwaukee, for providing, to this writer, context to the numerous technical disclosures on semiconductor processes made at IEDM 1998, IEDM 2007, and every IEDM in between.
Dr. Krishnan Kailas of IBM T.J. Watson Research Center, for providing context to the presentations made at Symposium on VLSI Technology, 2007.
Dr. Philip Ferolito of MetaRAM, for providing insight into the importance of NBTI in contemporary semiconductor devices.
Copyright
Copyright 2007, David T. Wang, Ph.D., All rights reserved.
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